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Solubility of Gases in Binary Liquid Mixtures: An Experimental and 20. Solubility of He, Ne, Ar, Kr, N2, O2, CH4, CF4, and SF6 in

Electron swarm coefficients in SF6 and CF4 gas mixtures from

Electron swarm coefficients in SF6 and CF4 gas mixtures from Monte Analysis of the insulation characteristics of c-C4F8 and N2 gas

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2017101- on the insulation characteristics of SF6-N2 and SF6-CF4 gas mixturesThus, the user can obtain electron transport and rate coefficients (

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The films deposition rate was found to increase with the decreasing CF4 concentration in the gas mixture. Fourier transform spectroscopy revealed the

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The Solubility of Gases in Liquids 9. Solubility of He, Ne, Ar, Kr, N2, O2, CO, CO2, CH4, CF4, and SF6 in some Dimethylcyclohexanes at 298

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The films deposition rate was found to increase with the decreasing CF4 concentration in the gas mixture. Fourier transform spectroscopy revealed the

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Negative ion motion in the mixtures of SF6 with CF4 and CH4-Ar.

This paper deals with the measurement of the mobility of negative ions in the mixtures of SF6 with CF4 and the CH4-Ar (50:50) binary mixture with

Breakdown characteristics of SF6 /CF4 mixtures in 25.8 kV

SFsub6/sub gas has excellent dielectric strength, but it causes global warming about 23900 times more than COsub2/

of 13 non-polar gases (He, Ne, Ar, Kr, Xe, H2~, D2~, N2~,

2015311-Get this from a library! Solubility of 13 non-polar gases (He, Ne, Ar, Kr, Xe, H2~, D2~, N2~, CH4~, C2~H4~, C2~H6~, CF4~ and SF6~

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Solubility of Gases in Liquids. 19. Solubility of He, Ne, Ar, Kr, Xe, N2, O2, CH4, CF4, and SF6 in Normal 1-Alkanols n-ClH2l+lOH (1

gases in liquids. 12 Solubility of He, Ne, Ar, Kr, O2, N2,

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of Gases in Liquids. 20. Solubility of He, Ne, Ar, Kr, N2,

The Ostwald coefficients L2,1 of He, Ne, Ar, Kr, N2, O2, CH4, CF4, and SF6 dissolved in several homologous n-alkanes, n-ClH2l+2, 6 ≤ l

for separation of SF6 from CF4 /air-containing gas stream

2002521-A method and apparatus for the separation and recovery of SF.sub.6 from a gas mixture consisting essentially of SF.sub.6, CF.sub.4, and N.su

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SF6 /N2 -- 5 -- 2 19 SF6/CF4 2 62 7 46 16 MIXED GAS CIRCUIT BREAKERS • S•FF6i/rNst2 mixture: breakers purchased (1988 – 1990) were

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Reactive ion etching of SiC in SF6 gas: detection of CF, CF2 and SiF2 etch products. Applied Physics Letters, American Institute of Physics, 2001,

Decomposed Das Density of CF3I as a Substitute for SF6 Gas

1- Interruption Capability and Decomposed Das Density of CF3I as a Substitute for SF6 Gas.2- Electrical Breakdown of CF3I and CF3I-N2 Gas Mixture

Use of SF6 and CF4 | SpringerLink

The design and use of equipment and installations applying SF6 gas or SF6/CF4 gas mixtures have been considered in Sect.  12.2and Part C of this

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